| DOI | Trouver le DOI : https://doi.org/10.1021/nl203488a |
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| Auteur | Rechercher : Wu, Nathanael L. Y.1; Rechercher : Zhang, Xiaojiang1; Rechercher : Murphy, Jeffrey N.1; Rechercher : Chai, Jinan1; Rechercher : Harris, Kenneth D.1; Rechercher : Buriak, Jillian M.1 |
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| Affiliation | - Conseil national de recherches du Canada. Institut national de nanotechnologie
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| Format | Texte, Article |
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| Sujet | Block copolymer; solvent anneal; self-assembly; density doubling; graphoepitaxy; thin films; nanolines |
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| Résumé | Block copolymers can be used to template large arrays of nanopatterns with periodicities equal to the characteristic spacing of the polymer. Here we demonstrate a technique capitalizing on the multilayered arrangement of cylindrical domains to effectively double the pattern density templated by a given polymer. By controlling the initial thickness of the film and the solvent annealing conditions, it was possible to reproducibly create density doubled lines by swelling the film with solvent until bilayers of horizontal cylinders were obtained. This process was also demonstrated to be compatible with graphoepitaxy. |
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| Date de publication | 2011-12-14 |
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| Dans | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Numéro NPARC | 21268907 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | bc76c3bc-9257-45f5-bf7e-81ebba6942f8 |
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| Enregistrement créé | 2013-11-25 |
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| Enregistrement modifié | 2020-04-21 |
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