3D GOI CMOSFETs with Novel IrO2(Hf) Dual Gates and High-k Dielectric on 1P6M-0.18μm-CMOS

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1109/IEDM.2004.1419101
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  1. National Research Council of Canada. NRC Institute for Biological Sciences
  2. National Research Council of Canada. NRC Institute for Microstructural Sciences
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NPARC number12744062
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