| DOI | Trouver le DOI : https://doi.org/10.1364/OL.20.001450 |
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| Auteur | Rechercher : Montcalm, Claude1; Rechercher : Sullivan, Brian T.1; Rechercher : Duguay, Sophie1; Rechercher : Ranger, M.1; Rechercher : Steffens, W.1; Rechercher : Pépin, Henri; Rechercher : Chaker, M. |
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| Affiliation | - Conseil national de recherches Canada. Institut des sciences des microstructures du CNRC
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| Format | Texte, Article |
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| Résumé | With a new ultrahigh-vacuum deposition/ref lectometer system, Mo/Y multilayer mirrors were deposited by dc-magnetron sputtering and characterized in situ with synchrotron radiation. The Mo/Y multilayer mirrors, measured before exposure to air, had near-normal-incidence reflectances as high as 46% at wavelengths near 11.4 nm. After several days of exposure these samples typically had a relative reflectance loss of ~10% as a result of oxidation of the top Mo layer. The best Mo/Y multilayers were fabricated with base pressures below the low 10-9 Torr range and after a bakeout to reduce water vapor in the chamber. |
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| Date de publication | 1995-06-15 |
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| Dans | |
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| Numéro NPARC | 12327606 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | db41f240-b509-4f74-9d85-1c892f7ab8f9 |
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| Enregistrement créé | 2009-09-10 |
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| Enregistrement modifié | 2020-04-29 |
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